dc.contributor.author | Goethals, Mieke | |
dc.contributor.author | Jonckheere, Rik | |
dc.contributor.author | Lorusso, Gian | |
dc.contributor.author | Hermans, Jan | |
dc.contributor.author | Van Roey, Frieda | |
dc.contributor.author | Myers, Alan | |
dc.contributor.author | Chandhok, Manish | |
dc.contributor.author | Kim, In Sung | |
dc.contributor.author | Niroomand, Ardavan | |
dc.contributor.author | Iwamoto, Fumio | |
dc.contributor.author | Stepanenko, Nickolay | |
dc.contributor.author | Gronheid, Roel | |
dc.contributor.author | Baudemprez, Bart | |
dc.contributor.author | Ronse, Kurt | |
dc.date.accessioned | 2021-10-16T16:18:05Z | |
dc.date.available | 2021-10-16T16:18:05Z | |
dc.date.issued | 2007 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/12203 | |
dc.source | IIOimport | |
dc.title | EUV lithography program at IMEC | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Jonckheere, Rik | |
dc.contributor.imecauthor | Lorusso, Gian | |
dc.contributor.imecauthor | Hermans, Jan | |
dc.contributor.imecauthor | Van Roey, Frieda | |
dc.contributor.imecauthor | Gronheid, Roel | |
dc.contributor.imecauthor | Baudemprez, Bart | |
dc.contributor.imecauthor | Ronse, Kurt | |
dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
dc.contributor.orcidimec | Hermans, Jan::0000-0003-1249-8902 | |
dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
dc.source.peerreview | no | |
dc.source.beginpage | 651709 | |
dc.source.conference | Emerging Lithographic Technologies XI | |
dc.source.conferencedate | 27/02/2007 | |
dc.source.conferencelocation | San Jose, CA USA | |
imec.availability | Published - imec | |
imec.internalnotes | SPIE Proc.; Vol. 6517 | |