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dc.contributor.authorGoethals, Mieke
dc.contributor.authorJonckheere, Rik
dc.contributor.authorLorusso, Gian
dc.contributor.authorHermans, Jan
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorMyers, Alan
dc.contributor.authorChandhok, Manish
dc.contributor.authorKim, In Sung
dc.contributor.authorNiroomand, Ardavan
dc.contributor.authorIwamoto, Fumio
dc.contributor.authorStepanenko, Nickolay
dc.contributor.authorGronheid, Roel
dc.contributor.authorBaudemprez, Bart
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-16T16:18:05Z
dc.date.available2021-10-16T16:18:05Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12203
dc.sourceIIOimport
dc.titleEUV lithography program at IMEC
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorBaudemprez, Bart
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.source.peerreviewno
dc.source.beginpage651709
dc.source.conferenceEmerging Lithographic Technologies XI
dc.source.conferencedate27/02/2007
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec
imec.internalnotesSPIE Proc.; Vol. 6517


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