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Optimisation methodology towards a manufacturable 0.3 μm poly-gate process using i-line lithography
Publication:
Optimisation methodology towards a manufacturable 0.3 μm poly-gate process using i-line lithography
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Date
1996
Proceedings Paper
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1196.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Finders, Jo
;
Bruggeman, B.
;
Ronse, Kurt
;
Van den hove, Luc
;
Tzviatkov, Plamen
;
Dusa, M.
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2
since deposited on 2021-09-29
Acq. date: 2026-01-12
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2006
since deposited on 2021-09-29
Acq. date: 2026-01-12
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Metrics
Downloads
2
since deposited on 2021-09-29
Acq. date: 2026-01-12
Views
2006
since deposited on 2021-09-29
Acq. date: 2026-01-12
Citations