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Investigation of aggressively scaled HfALOx-based interpoly dielectric stacks for sub-45nm nonvolatile memory technologies

dc.contributor.authorGovoreanu, Bogdan
dc.contributor.authorWellekens, Dirk
dc.contributor.authorHaspeslagh, Luc
dc.contributor.authorBrunco, David
dc.contributor.authorDe Vos, Joeri
dc.contributor.authorRuiz Aguado, Daniel
dc.contributor.authorBlomme, Pieter
dc.contributor.authorvan der Zanden, Koen
dc.contributor.authorVan Houdt, Jan
dc.date.accessioned2021-10-16T16:21:48Z
dc.date.available2021-10-16T16:21:48Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12219
dc.sourceIIOimport
dc.titleInvestigation of aggressively scaled HfALOx-based interpoly dielectric stacks for sub-45nm nonvolatile memory technologies
dc.typeProceedings paper
dc.contributor.imecauthorGovoreanu, Bogdan
dc.contributor.imecauthorWellekens, Dirk
dc.contributor.imecauthorHaspeslagh, Luc
dc.contributor.imecauthorDe Vos, Joeri
dc.contributor.imecauthorBlomme, Pieter
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.orcidimecDe Vos, Joeri::0000-0002-9332-9336
dc.contributor.orcidimecVan Houdt, Jan::0000-0003-1381-6925
dc.source.peerreviewno
dc.source.beginpage231
dc.source.endpage234
dc.source.conferenceProceedings 2nd International Conference on Memory technology and Design - ICMTD
dc.source.conferencedate7/05/2007
dc.source.conferencelocationGiens France
imec.availabilityPublished - imec


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