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Lithography options for the 32nm half pitch node

dc.contributor.authorGronheid, Roel
dc.contributor.authorErcken, Monique
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-16T16:24:45Z
dc.date.available2021-10-16T16:24:45Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12232
dc.sourceIIOimport
dc.titleLithography options for the 32nm half pitch node
dc.typeOral presentation
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.source.peerreviewno
dc.source.conference7th Entegris Lithography Technology Roadmap Conference
dc.source.conferencedate5/06/2007
dc.source.conferencelocationTemecula, CA USA
imec.availabilityPublished - imec


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