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EUV lithography with the alpha demo tools: status and challenges

dc.contributor.authorHarned, Noreen
dc.contributor.authorGoethals, Mieke
dc.contributor.authorGroeneveld, Rogier
dc.contributor.authorKuerz, Peter
dc.contributor.authorLowisch, Martin
dc.contributor.authorMeijer, Henk
dc.contributor.authorMeiling, Hans
dc.contributor.authorRonse, Kurt
dc.contributor.authorRyan, Jim
dc.contributor.authorTittnich, Mike
dc.contributor.authorVoorma, Harm-Jan
dc.contributor.authorZimmmerman, John
dc.contributor.authorMickan, Uwe
dc.contributor.authorLok, Sjoerd
dc.date.accessioned2021-10-16T16:31:05Z
dc.date.available2021-10-16T16:31:05Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12257
dc.sourceIIOimport
dc.titleEUV lithography with the alpha demo tools: status and challenges
dc.typeProceedings paper
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage651706
dc.source.conferenceEmerging Lithographic Technologies XI
dc.source.conferencedate27/02/2007
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE, Vol. 6517


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