Authors

Hellin, David; Vos, Ingrid; Vereecke, Guy; Pavel, E.; Boullart, Werner; Vertommen, Johan

Conference

Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10

Title

The effect of delay between dry etch and wet clean processing steps on cleaning of post-etch residues

Publication type

Proceedings paper

Embargo date

9999-12-31