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Advanced process control for hyper-NA lithography based on CD-SEM measurement

dc.contributor.authorIshimoto, Toru
dc.contributor.authorSekiguchi, K.
dc.contributor.authorHasegawa, N.
dc.contributor.authorMaeda, T.
dc.contributor.authorWatanabe, K.
dc.contributor.authorStorms, Greet
dc.contributor.authorLaidler, David
dc.contributor.authorCheng, Shaunee
dc.date.accessioned2021-10-16T16:50:39Z
dc.date.available2021-10-16T16:50:39Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12337
dc.sourceIIOimport
dc.titleAdvanced process control for hyper-NA lithography based on CD-SEM measurement
dc.typeProceedings paper
dc.contributor.imecauthorLaidler, David
dc.contributor.orcidimecLaidler, David::0000-0003-4055-3366
dc.source.peerreviewno
dc.source.beginpage65182P
dc.source.conferenceMetrology, Inspection and Process Control for Microlithography XXI
dc.source.conferencedate25/02/2007
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec
imec.internalnotesSPIE Proc,; Vol. 6518


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