0.18 μm lithography : using 248 nm deep-UV and top surface imaging

View/open

1209.pdf (833.2Kb)

Metadata

Show full item record

Authors

Goethals, Mieke; Van den hove, Luc

Issue

4

Journal

Semiconductor Fabtech

Title

0.18 μm lithography : using 248 nm deep-UV and top surface imaging

Publication type

Journal article

Embargo date

9999-12-31

Collections

Articles