0.18 μm lithography : using 248 nm deep-UV and top surface imaging

dc.contributor.author	Goethals, Mieke
dc.contributor.author	Van den hove, Luc
dc.date.accessioned	2021-09-29T14:30:38Z
dc.date.available	2021-09-29T14:30:38Z
dc.date.issued	1996
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/1234
dc.source	IIOimport
dc.title	0.18 μm lithography : using 248 nm deep-UV and top surface imaging
dc.type	Journal article
dc.contributor.imecauthor	Van den hove, Luc
dc.date.embargo	9999-12-31
dc.source.peerreview	no
dc.source.beginpage	169
dc.source.endpage	173
dc.source.journal	Semiconductor Fabtech
dc.source.issue	4
imec.availability	Published - open access