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Top-surface imaging and optical proximity correction: a way to 0.18 µm lithography at 248 nm

dc.contributor.authorGoethals, Mieke
dc.contributor.authorVertommen, Johan
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorYen, Anthony
dc.contributor.authorTritchkov, Alexander
dc.contributor.authorRonse, Kurt
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVan den hove, Luc
dc.date.accessioned2021-09-29T14:30:47Z
dc.date.available2021-09-29T14:30:47Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1235
dc.sourceIIOimport
dc.titleTop-surface imaging and optical proximity correction: a way to 0.18 µm lithography at 248 nm
dc.typeProceedings paper
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage362
dc.source.endpage374
dc.source.conferenceOptical Microlithography IX
dc.source.conferencedate10/03/1996
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 2726


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