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Full field EUV lithography turning into reality at IMEC

dc.contributor.authorJonckheere, Rik
dc.contributor.authorLorusso, Gian
dc.contributor.authorGoethals, Mieke
dc.contributor.authorHermans, Jan
dc.contributor.authorBaudemprez, Bart
dc.contributor.authorMyers, Alan
dc.contributor.authorKim, In Sung
dc.contributor.authorNiroomand, Ardavan
dc.contributor.authorIwamoto, Fumio
dc.contributor.authorStepanenko, Nickolay
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-16T16:58:35Z
dc.date.available2021-10-16T16:58:35Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12368
dc.sourceIIOimport
dc.titleFull field EUV lithography turning into reality at IMEC
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorBaudemprez, Bart
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage66070H
dc.source.conferencePhotomask Japan (PMJ) - Photomask and Next-Generation Lithography Mask Technology XIV
dc.source.conferencedate17/04/2007
dc.source.conferencelocationYokohama Japan
imec.availabilityPublished - open access
imec.internalnotesSPIE Proceedings; Vol. 6607


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