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Overview on double exposure and double patterning

dc.contributor.authorJonckheere, Rik
dc.contributor.authorMaenhoudt, Mireille
dc.date.accessioned2021-10-16T16:59:04Z
dc.date.available2021-10-16T16:59:04Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12370
dc.sourceIIOimport
dc.titleOverview on double exposure and double patterning
dc.typeOral presentation
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferencePhotomask Japan (PMJ) - Photomask and Next-Generation Lithography Mask Technology XIV
dc.source.conferencedate17/04/2007
dc.source.conferencelocationYokohama Japan
imec.availabilityPublished - open access


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