Show simple item record

Quantitative measurement of pattern collapse and particle removal force

dc.contributor.authorKim, Tae-Gon
dc.contributor.authorWostyn, Kurt
dc.contributor.authorMertens, Paul
dc.contributor.authorBusnaina, Ahmed
dc.contributor.authorPark, Jin-Goo
dc.date.accessioned2021-10-16T17:06:46Z
dc.date.available2021-10-16T17:06:46Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12399
dc.sourceIIOimport
dc.titleQuantitative measurement of pattern collapse and particle removal force
dc.typeProceedings paper
dc.contributor.imecauthorWostyn, Kurt
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecWostyn, Kurt::0000-0003-3995-0292
dc.source.peerreviewno
dc.source.beginpage123
dc.source.endpage129
dc.source.conferenceCleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10
dc.source.conferencedate7/10/2007
dc.source.conferencelocationWashington, DC USA
imec.availabilityPublished - imec
imec.internalnotesECS Trans.; Vol. 11, issue 2


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record