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Combination of e-beam lithography and of high velocity AlN/diamond-layered structure for SAW filters in X band

dc.contributor.authorKirsch, Philippe
dc.contributor.authorAssouar, Mohammed B.
dc.contributor.authorElmazria, Omar
dc.contributor.authorEl Hakiki, M.
dc.contributor.authorMortet, Vincent
dc.contributor.authorAlnot, Patrick
dc.date.accessioned2021-10-16T17:07:32Z
dc.date.available2021-10-16T17:07:32Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12402
dc.sourceIIOimport
dc.titleCombination of e-beam lithography and of high velocity AlN/diamond-layered structure for SAW filters in X band
dc.typeJournal article
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1486
dc.source.endpage1491
dc.source.journalIEEE Trans. Ultrasonics, Ferroelectrics, and Frequency Control
dc.source.issue7
dc.source.volume54
imec.availabilityPublished - open access


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