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Improved thermal stability of Ni-silicides on Si:C epitaxial layers

dc.contributor.authorMachkaoutsan, Vladimir
dc.contributor.authorMertens, Sofie
dc.contributor.authorBauer, R.
dc.contributor.authorLauwers, Anne
dc.contributor.authorVerheyden, Kurt
dc.contributor.authorVanormelingen, Koen
dc.contributor.authorVerheyen, Peter
dc.contributor.authorLoo, Roger
dc.contributor.authorCaymax, Matty
dc.contributor.authorJakschik, Stefan
dc.contributor.authorTheodore, D.
dc.contributor.authorAbsil, Philippe
dc.contributor.authorThomas, S.
dc.contributor.authorGranneman, E.H.A.
dc.date.accessioned2021-10-16T17:43:20Z
dc.date.available2021-10-16T17:43:20Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12530
dc.sourceIIOimport
dc.titleImproved thermal stability of Ni-silicides on Si:C epitaxial layers
dc.typeJournal article
dc.contributor.imecauthorMachkaoutsan, Vladimir
dc.contributor.imecauthorMertens, Sofie
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.orcidimecMertens, Sofie::0000-0002-1482-6730
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage2542
dc.source.endpage2546
dc.source.journalMicroelectronic Engineering
dc.source.volume84
imec.availabilityPublished - open access
imec.internalnotesMaterials for Advanced Metalization - MAM


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