Toggle navigation
My submissions
Login
Toggle navigation
View item
imec Publications Repository
imec Publications
Conference contributions
View item
imec Publications Repository
imec Publications
Conference contributions
View item
JavaScript is disabled for your browser. Some features of this site may not work without it.
Hierarchical E-beam proximity correction in mask making
View/
open
1237.pdf (353.0Kb)
Metadata
Show full item record
Authors
Hofmann, U.
;
Kalus, C.
;
Rosenbusch, A.
;
Jonckheere, Rik
;
Hourd, A.
Conference
Electrtron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI
Title
Hierarchical E-beam proximity correction in mask making
Publication type
Proceedings paper
Embargo date
9999-12-31
Collections
Conference contributions
Search imec Publications Repository
This collection
Browse
All of imec Publications Repository
Collections
Publication date
Authors
Titles
Subjects
imec author
Availability
Publication type
This collection
Publication date
Authors
Titles
Subjects
imec author
Availability
Publication type
My account
login