Publication:

High mobility strained Ge pMOSFETs with high-k/metal gate

Date

2007

Journal article

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Files

16251.pdf 125.68 KB

Author(s)

Nicholas, Gareth

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Fulgoni, D.J.F.

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Journal

IEEE Electron Device Letters

Metrics

1905 since deposited on 2021-10-16

1last month

Acq. date: 2026-01-08