Electron mobility calculations for Si, Ge and III-V inversion layers with HfO2

Thumbnail
Metadata
Show full item record
Authors
O'Regan, Terrance; Fischetti, Massimo; Soree, Bart; Magnus, Wim
Conference
12th International Workshop on Computational Electronics - IWCE12
Title
Electron mobility calculations for Si, Ge and III-V inversion layers with HfO2
Publication type
Proceedings paper
Collections