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Evaluation of triple-gate FinFETs with SiO2-HfO2-TiN gate stack under analog operation
Publication:
Evaluation of triple-gate FinFETs with SiO2-HfO2-TiN gate stack under analog operation
Date
2007
Journal article
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Pavanello, M.A.
;
Martino, J.A.
;
Simoen, Eddy
;
Rooyackers, Rita
;
Collaert, Nadine
;
Claeys, Cor
Journal
Solid-State Electronics
Abstract
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1919
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Citations
Metrics
Views
1919
since deposited on 2021-10-16
431
item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations