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Junction architecture for planar devices

dc.contributor.authorPawlak, Bartek
dc.contributor.authorDuffy, R.
dc.contributor.authorHoffmann, Thomas Y.
dc.contributor.authorSeveri, Simone
dc.contributor.authorFelch, S.B.
dc.contributor.authorEyben, Pierre
dc.contributor.authorVan Daele, Benny
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorLander, Rob
dc.date.accessioned2021-10-16T18:31:02Z
dc.date.available2021-10-16T18:31:02Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12682
dc.sourceIIOimport
dc.titleJunction architecture for planar devices
dc.typeProceedings paper
dc.contributor.imecauthorPawlak, Bartek
dc.contributor.imecauthorSeveri, Simone
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorVandervorst, Wilfried
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage351
dc.source.endpage364
dc.source.conferenceAdvanced Gate Stack, Source/Drain and Channel Engineering for Si-Based CMOS 3: New Materials, Processes and Equipment
dc.source.conferencedate6/05/2007
dc.source.conferencelocationChicago, IL USA
dc.identifier.urlhttp://www.electrochem.org/meetings/biannual/211/211.htm http://www.electrochem.org/meetings/biannual/211/211.htm
imec.availabilityPublished - open access
imec.internalnotesECS Trans.; Vol. 6, issue 1


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