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IMEC lithography activities for 45nm node and beyond: mask impact

dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorHendrickx, Eric
dc.contributor.authorWiaux, Vincent
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorJonckheere, Rik
dc.date.accessioned2021-10-16T18:37:14Z
dc.date.available2021-10-16T18:37:14Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12702
dc.sourceIIOimport
dc.titleIMEC lithography activities for 45nm node and beyond: mask impact
dc.typeOral presentation
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.source.peerreviewno
dc.source.conferenceToppan Technical Forum
dc.source.conferencedate9/11/2007
dc.source.conferencelocationHsinChu Taiwan
imec.availabilityPublished - imec


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