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Impact of alternative mask stacks on the imaging performance at NA 1.20 and above

dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorMesuda, Kei
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorErdmann, Andreas
dc.contributor.authorCitarella, Giuseppe
dc.contributor.authorEvanschitzky, Peter
dc.contributor.authorBirkner, Robert
dc.contributor.authorRichter, Rigo
dc.contributor.authorScherübl, Thomas
dc.date.accessioned2021-10-16T18:37:34Z
dc.date.available2021-10-16T18:37:34Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12703
dc.sourceIIOimport
dc.titleImpact of alternative mask stacks on the imaging performance at NA 1.20 and above
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage67301N
dc.source.conferenceSPIE Photomask Technology (BACUS)
dc.source.conferencedate18/09/2007
dc.source.conferencelocationMonterey, CA USA
imec.availabilityPublished - open access
imec.internalnotesSPIE proceedings, vol.6730


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