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Innovative metrology for wafer edge defectivity in immersion lithography

dc.contributor.authorPollentier, Ivan
dc.contributor.authorIwamoto, Fumio
dc.contributor.authorKocsis, Michael
dc.contributor.authorSomanchi, Anoop
dc.contributor.authorBurkeen, Frank
dc.contributor.authorVedula, Srinivas
dc.date.accessioned2021-10-16T18:43:43Z
dc.date.available2021-10-16T18:43:43Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12723
dc.sourceIIOimport
dc.titleInnovative metrology for wafer edge defectivity in immersion lithography
dc.typeProceedings paper
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorKocsis, Michael
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.source.peerreviewyes
dc.source.beginpage65180T
dc.source.conferenceMetrology, Inspection and Process Control for Microlithography XXI
dc.source.conferencedate25/02/2007
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec
imec.internalnotesSPIE Proceedings; Vol. 6518


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