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Electrochemical deposition of manganese and copper-manganese alloy on silicon

dc.contributor.authorRadisic, Alex
dc.contributor.authorHernandez, Jose Luis
dc.contributor.authorTokei, Zsolt
dc.contributor.authorBeyer, Gerald
dc.contributor.authorVereecken, Philippe
dc.date.accessioned2021-10-16T18:51:56Z
dc.date.available2021-10-16T18:51:56Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12748
dc.sourceIIOimport
dc.titleElectrochemical deposition of manganese and copper-manganese alloy on silicon
dc.typeProceedings paper
dc.contributor.imecauthorRadisic, Alex
dc.contributor.imecauthorHernandez, Jose Luis
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.imecauthorVereecken, Philippe
dc.contributor.orcidimecVereecken, Philippe::0000-0003-4115-0075
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage69
dc.source.endpage76
dc.source.conferenceElectrochemical Deposition on Non-Metallic Surfaces, Patterned Substrates, and Templates
dc.source.conferencedate29/10/2006
dc.source.conferencelocationCancun Mexico
dc.identifier.urlhttp://scitation.aip.org/getpdf/servlet/GetPDFServlet?filetype=pdf&id=ECSTF8000003000021000069000001&idtype=cvips
imec.availabilityPublished - open access
imec.internalnotesECS Trans.; Vol 3, Iss 21


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