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Evolution of silicon cleaning technology over the last twenty years

dc.contributor.authorRuzyllo, J.
dc.contributor.authorHattori, T.
dc.contributor.authorNovak, R.E.
dc.contributor.authorMertens, Paul
dc.contributor.authorBesson, P.
dc.date.accessioned2021-10-16T19:17:33Z
dc.date.available2021-10-16T19:17:33Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12824
dc.sourceIIOimport
dc.titleEvolution of silicon cleaning technology over the last twenty years
dc.typeProceedings paper
dc.contributor.imecauthorMertens, Paul
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage3
dc.source.endpage7
dc.source.conferenceCleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10
dc.source.conferencedate7/10/2007
dc.source.conferencelocationWashington, DC USA
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 11, issue 2


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