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Barrier deposition for advanced interconnects

dc.contributor.authorSchaekers, Marc
dc.contributor.authorTokei, Zsolt
dc.contributor.authorLi, Yong-Li
dc.contributor.authorCarbonell, Laure
dc.date.accessioned2021-10-16T19:24:54Z
dc.date.available2021-10-16T19:24:54Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12845
dc.sourceIIOimport
dc.titleBarrier deposition for advanced interconnects
dc.typeProceedings paper
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.source.peerreviewno
dc.source.beginpage131
dc.source.endpage138
dc.source.conferenceAtomic Layer Deposition Applications 2
dc.source.conferencedate29/10/2006
dc.source.conferencelocationCancun Mexico
imec.availabilityPublished - imec
imec.internalnotesECS Transactions; Vol. 3, issue 15


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