Transmission electron microscopic study of new FeSi2 and TiSi2 phases prepared by ion implantation
dc.contributor.author | Jin, S. | |
dc.contributor.author | Bender, Hugo | |
dc.contributor.author | Li, Xiuqiong | |
dc.contributor.author | Dong, C. | |
dc.contributor.author | Zhang, Zheng | |
dc.date.accessioned | 2021-09-29T14:37:12Z | |
dc.date.available | 2021-09-29T14:37:12Z | |
dc.date.issued | 1996 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/1285 | |
dc.source | IIOimport | |
dc.title | Transmission electron microscopic study of new FeSi2 and TiSi2 phases prepared by ion implantation | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Bender, Hugo | |
dc.source.peerreview | no | |
dc.source.conference | EUREM96 - XIth European Congress on Microscopy; August 26-30, 1996; Dublin, Ireland. | |
dc.source.conferencelocation | ||
imec.availability | Published - imec |
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