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Iodine enhanced focused-ion-beam etching of silicon for photonic applications

dc.contributor.authorSchrauwen, Jonathan
dc.contributor.authorVan Thourhout, Dries
dc.contributor.authorBaets, Roel
dc.date.accessioned2021-10-16T19:32:58Z
dc.date.available2021-10-16T19:32:58Z
dc.date.issued2007-11
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12869
dc.sourceIIOimport
dc.titleIodine enhanced focused-ion-beam etching of silicon for photonic applications
dc.typeJournal article
dc.contributor.imecauthorVan Thourhout, Dries
dc.contributor.imecauthorBaets, Roel
dc.contributor.orcidimecVan Thourhout, Dries::0000-0003-0111-431X
dc.contributor.orcidimecBaets, Roel::0000-0003-1266-1319
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage103101
dc.source.journalJournal of Applied Physics
dc.source.issue10
dc.source.volume102
imec.availabilityPublished - open access


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