Iodine enhanced focused-ion-beam etching of silicon for photonic applications

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Authors

Schrauwen, Jonathan; Van Thourhout, Dries; Baets, Roel

Issue

10

Journal

Journal of Applied Physics

Volume

102

Title

Iodine enhanced focused-ion-beam etching of silicon for photonic applications

Publication type

Journal article

Embargo date

9999-12-31

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