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Articles
Optical proximity correction: mask pattern-generation challenges
Publication:
Optical proximity correction: mask pattern-generation challenges
Date
1996
Journal article
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1264.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Jonckheere, Rik
;
Wong, Alfred
;
Yen, Anthony
;
Ronse, Kurt
;
Van den hove, Luc
Journal
Microelectronic Engineering
Abstract
Description
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Views
1900
since deposited on 2021-09-29
Acq. date: 2025-10-24
Citations
Metrics
Views
1900
since deposited on 2021-09-29
Acq. date: 2025-10-24
Citations