Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Articles
Optical proximity correction: mask pattern-generation challenges
Publication:
Optical proximity correction: mask pattern-generation challenges
Copy permalink
Date
1996
Journal article
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
1264.pdf
425.13 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Jonckheere, Rik
;
Wong, Alfred
;
Yen, Anthony
;
Ronse, Kurt
;
Van den hove, Luc
Journal
Microelectronic Engineering
Abstract
Description
Metrics
Views
1902
since deposited on 2021-09-29
1
last month
Acq. date: 2025-12-12
Citations
Metrics
Views
1902
since deposited on 2021-09-29
1
last month
Acq. date: 2025-12-12
Citations