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A plasma etch process for bulk finFET manufacturing

dc.contributor.authorShamiryan, Denis
dc.contributor.authorRedolfi, Augusto
dc.contributor.authorBoullart, Werner
dc.date.accessioned2021-10-16T19:38:35Z
dc.date.available2021-10-16T19:38:35Z
dc.date.issued2007-10
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12885
dc.sourceIIOimport
dc.titleA plasma etch process for bulk finFET manufacturing
dc.typeProceedings paper
dc.contributor.imecauthorRedolfi, Augusto
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.source.peerreviewyes
dc.source.conferenceInternational Conference on Micro- and Nanoelectronics
dc.source.conferencedate1/10/2007
dc.source.conferencelocationZvenigorod Russia
imec.availabilityPublished - imec


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