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Scaling down of MOCVD HfSiON to 1nm EOT
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Scaling down of MOCVD HfSiON to 1nm EOT
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Date
2007-10
Proceedings Paper
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15497.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Shi, Xiaoping
;
Rothschild, Aude
;
Everaert, Jean-Luc
;
Van Elshocht, Sven
;
Date, Lucien
;
Schreutelkamp, Rob
;
Schaekers, Marc
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1929
since deposited on 2021-10-16
Acq. date: 2025-12-16
Citations
Metrics
Views
1929
since deposited on 2021-10-16
Acq. date: 2025-12-16
Citations