Scaling down of MOCVD HfSiON to 1nm EOT

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Authors
Shi, Xiaoping; Rothschild, Aude; Everaert, Jean-Luc; Van Elshocht, Sven; Date, Lucien; Schreutelkamp, Rob; Schaekers, Marc
Conference
Physics and Technology of High-K Dielectrics
Title
Scaling down of MOCVD HfSiON to 1nm EOT
Publication type
Proceedings paper
Embargo date
9999-12-31
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