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dc.contributor.authorShickova, Adelina
dc.contributor.authorKauerauf, Thomas
dc.contributor.authorRothschild, Aude
dc.contributor.authorAoulaiche, Marc
dc.contributor.authorSahhaf, Sahar
dc.contributor.authorKaczer, Ben
dc.contributor.authorVeloso, Anabela
dc.contributor.authorTorregiani, Cristina
dc.contributor.authorPantisano, Luigi
dc.contributor.authorLauwers, Anne
dc.contributor.authorZahid, Mohammed
dc.contributor.authorRost, Tim
dc.contributor.authorTigelaar, H.
dc.contributor.authorPas, M.
dc.contributor.authorFretwell, J.
dc.contributor.authorMcCormack, J.
dc.contributor.authorHoffmann, Thomas
dc.contributor.authorKerner, Christoph
dc.contributor.authorChiarella, Thomas
dc.contributor.authorBrus, Stephan
dc.contributor.authorHarada, Yoshinao
dc.contributor.authorNiwa, Masaaki
dc.contributor.authorKaushik, Vidya
dc.contributor.authorMaes, Herman
dc.contributor.authorAbsil, Philippe
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorBiesemans, Serge
dc.contributor.authorKittl, Jorge
dc.date.accessioned2021-10-16T19:41:50Z
dc.date.available2021-10-16T19:41:50Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12893
dc.sourceIIOimport
dc.titleAddressing key concerns for implementation of Ni FUSI into manufacturing for 45/32 nm CMOS
dc.typeProceedings paper
dc.contributor.imecauthorSahhaf, Sahar
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorKerner, Christoph
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorBrus, Stephan
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage158
dc.source.endpage159
dc.source.conferenceSymposium on VLSI. Technology Digest of Technical Papers
dc.source.conferencedate14/06/2007
dc.source.conferencelocationKyoto Japan
imec.availabilityPublished - open access


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