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Metal inserted poly-Si (MIPS) and FUSI dual metal (TaN and NiSi) CMOS integration

dc.contributor.authorSinganamalla, Raghunath
dc.contributor.authorVan Dal, Mark
dc.contributor.authorDemand, Marc
dc.contributor.authorShamiryan, Denis
dc.contributor.authorBeckx, Stephan
dc.contributor.authorJaenen, Patrick
dc.contributor.authorLocorotondo, Sabrina
dc.contributor.authorYu, HongYu
dc.contributor.authorHooker, Jacob
dc.contributor.authorKubicek, Stefan
dc.contributor.authorDe Meyer, Kristin
dc.contributor.authorBiesemans, Serge
dc.contributor.authorJuffermans, Casper
dc.contributor.authorLander, Rob
dc.date.accessioned2021-10-16T19:49:12Z
dc.date.available2021-10-16T19:49:12Z
dc.date.issued2007-04
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12914
dc.sourceIIOimport
dc.titleMetal inserted poly-Si (MIPS) and FUSI dual metal (TaN and NiSi) CMOS integration
dc.typeProceedings paper
dc.contributor.imecauthorVan Dal, Mark
dc.contributor.imecauthorDemand, Marc
dc.contributor.imecauthorBeckx, Stephan
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorLocorotondo, Sabrina
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.imecauthorBiesemans, Serge
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on VLSI Technology, Systems, and Applications - VLSI-TSA
dc.source.conferencedate23/04/2007
dc.source.conferencelocationHsinchu Taiwan
imec.availabilityPublished - imec


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