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CD control for 180-nm and 130-nm gate-level lithography

dc.contributor.authorKim, Kee - Ho
dc.contributor.authorRonse, Kurt
dc.contributor.authorGoethals, Mieke
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorVan den hove, Luc
dc.date.accessioned2021-09-29T14:38:14Z
dc.date.available2021-09-29T14:38:14Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1292
dc.sourceIIOimport
dc.titleCD control for 180-nm and 130-nm gate-level lithography
dc.typeJournal article
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorVan den hove, Luc
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage16
dc.source.endpage21
dc.source.journalMicrolithography World
dc.source.issueAutumn
imec.availabilityPublished - open access


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