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Feasability demonstration of 0.18 µm and 0.13 µm optical projection lithography based on CD control calculations

dc.contributor.authorKim, Kee - Ho
dc.contributor.authorRonse, Kurt
dc.contributor.authorYen, Anthony
dc.contributor.authorVan den hove, Luc
dc.date.accessioned2021-09-29T14:38:23Z
dc.date.available2021-09-29T14:38:23Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1293
dc.sourceIIOimport
dc.titleFeasability demonstration of 0.18 µm and 0.13 µm optical projection lithography based on CD control calculations
dc.typeProceedings paper
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage186
dc.source.endpage187
dc.source.conferenceSymposium on VLSI Technology. Digest of Technical Papers
dc.source.conferencedate11/06/1996
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - imec


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