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Profile control for low-k patterning using TaN and TiN metallic hardmasks

dc.contributor.authorStruyf, Herbert
dc.contributor.authorHendrickx, Dirk
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorCampos Garcia, Diana
dc.contributor.authorMannaert, Geert
dc.contributor.authorBoullart, Werner
dc.contributor.authorVanhaelemeersch, Serge
dc.date.accessioned2021-10-16T20:03:30Z
dc.date.available2021-10-16T20:03:30Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12956
dc.sourceIIOimport
dc.titleProfile control for low-k patterning using TaN and TiN metallic hardmasks
dc.typeOral presentation
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorHendrickx, Dirk
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.source.peerreviewno
dc.source.conferenceMRS Spring Symposium B: Materials, Processes, Integration and Reliability in Advanced Interconnects for Micro- and Nanoelectron
dc.source.conferencedate9/04/2007
dc.source.conferencelocationSan Francisco, CA USA
dc.identifier.urlhttp://www.mrs.org/s_mrs/doc.asp?CID=8697&DID=193960
imec.availabilityPublished - imec


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