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Effect of helium plasma on low-k damage during dry resist strip

dc.contributor.authorUrbanowicz, Adam
dc.contributor.authorShamiryan, Denis
dc.contributor.authorKim, Dongchan
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-16T20:22:32Z
dc.date.available2021-10-16T20:22:32Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13007
dc.sourceIIOimport
dc.titleEffect of helium plasma on low-k damage during dry resist strip
dc.typeProceedings paper
dc.source.peerreviewno
dc.source.conference1st International Workshop Plasma Etch and Strip in Microelectronics - PESM
dc.source.conferencedate10/09/2007
dc.source.conferencelocationLeuven Belgium
dc.identifier.urlhttp://www.pesm2007.be/
imec.availabilityPublished - imec


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