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Performance assessment of novel resist approaches for EUV lithography using a single figure of merit

dc.contributor.authorVan Steenwinckel, David
dc.contributor.authorGronheid, Roel
dc.contributor.authorVan Roey, Frieda
dc.date.accessioned2021-10-16T20:56:38Z
dc.date.available2021-10-16T20:56:38Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13102
dc.sourceIIOimport
dc.titlePerformance assessment of novel resist approaches for EUV lithography using a single figure of merit
dc.typeProceedings paper
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorVan Roey, Frieda
dc.source.peerreviewno
dc.source.conference6th International EUVL Symposium
dc.source.conferencedate28/10/2007
dc.source.conferencelocationSapporo Japan
imec.availabilityPublished - imec


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