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Mass metrology for controlling and understanding processes

dc.contributor.authorVecchio, Emma
dc.contributor.authorKunnen, Eddy
dc.contributor.authorRedolfi, Augusto
dc.contributor.authorEveraert, Jean-Luc
dc.contributor.authorDelabie, Annelies
dc.contributor.authorShi, Xiaoping
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorCunnane, Liam
dc.contributor.authorKiermasz, Adrian
dc.date.accessioned2021-10-16T21:14:48Z
dc.date.available2021-10-16T21:14:48Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13152
dc.sourceIIOimport
dc.titleMass metrology for controlling and understanding processes
dc.typeProceedings paper
dc.contributor.imecauthorVecchio, Emma
dc.contributor.imecauthorRedolfi, Augusto
dc.contributor.imecauthorEveraert, Jean-Luc
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.source.peerreviewno
dc.source.conference16th Annual International Symposium on Semiconductor Manufacturing
dc.source.conferencedate15/10/2007
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - imec


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