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Advanced CMOS device technologies for 45nm node and below

dc.contributor.authorVeloso, Anabela
dc.contributor.authorHoffmann, Thomas
dc.contributor.authorLauwers, Anne
dc.contributor.authorYu, HongYu
dc.contributor.authorSeveri, Simone
dc.contributor.authorAugendre, Emmanuel
dc.contributor.authorKubicek, Stefan
dc.contributor.authorVerheyen, Peter
dc.contributor.authorCollaert, Nadine
dc.contributor.authorAbsil, Philippe
dc.contributor.authorJurczak, Gosia
dc.contributor.authorBiesemans, Serge
dc.date.accessioned2021-10-16T21:16:21Z
dc.date.available2021-10-16T21:16:21Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13155
dc.sourceIIOimport
dc.titleAdvanced CMOS device technologies for 45nm node and below
dc.typeJournal article
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorSeveri, Simone
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage214
dc.source.endpage218
dc.source.journalScience and Technology of Advanced Materials
dc.source.issue3
dc.source.volume8
imec.availabilityPublished - open access
imec.internalnotesPaper from International 21st Century COE Symposium on Atomistic Fabrication Technology


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