dc.contributor.author | Depas, Michel | |
dc.contributor.author | Vermeire, Bert | |
dc.contributor.author | Mertens, Paul | |
dc.contributor.author | Meuris, Marc | |
dc.contributor.author | Heyns, Marc | |
dc.date.accessioned | 2021-09-29T12:40:51Z | |
dc.date.available | 2021-09-29T12:40:51Z | |
dc.date.issued | 1994 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/131 | |
dc.source | IIOimport | |
dc.title | Ultra-thin gate oxide yield and reliability | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Mertens, Paul | |
dc.contributor.imecauthor | Meuris, Marc | |
dc.contributor.imecauthor | Heyns, Marc | |
dc.contributor.orcidimec | Meuris, Marc::0000-0002-9580-6810 | |
dc.source.peerreview | no | |
dc.source.beginpage | 23 | |
dc.source.endpage | 24 | |
dc.source.conference | Symposium on VLSI Technology | |
dc.source.conferencedate | 09/06/1994 | |
dc.source.conferencelocation | Hawaii USA | |
imec.availability | Published - imec | |