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Meeting double patterning challenges: from split to process control

dc.contributor.authorWiaux, Vincent
dc.contributor.authorCheng, Shaunee
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorStorms, Greet
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorVerhaegen, Staf
dc.date.accessioned2021-10-16T21:42:38Z
dc.date.available2021-10-16T21:42:38Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13222
dc.sourceIIOimport
dc.titleMeeting double patterning challenges: from split to process control
dc.typeOral presentation
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorVandenberghe, Geert
dc.source.peerreviewno
dc.source.conferenceNew Generation Lithography Workshop
dc.source.conferencedate12/07/2007
dc.source.conferencelocationTokyo Japan
imec.availabilityPublished - imec


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