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Particle removal from micrometer-sized trenches using high-velocity-aerosol cleaning and comparison with megasonic tank cleaning

dc.contributor.authorWostyn, Kurt
dc.contributor.authorSano, Ken-Ichi
dc.contributor.authorEitoku, A.
dc.contributor.authorJanssens, Tom
dc.contributor.authorBearda, Twan
dc.contributor.authorLeunissen, Peter
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-10-16T21:47:19Z
dc.date.available2021-10-16T21:47:19Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13234
dc.sourceIIOimport
dc.titleParticle removal from micrometer-sized trenches using high-velocity-aerosol cleaning and comparison with megasonic tank cleaning
dc.typeProceedings paper
dc.contributor.imecauthorWostyn, Kurt
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecWostyn, Kurt::0000-0003-3995-0292
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage55
dc.source.endpage60
dc.source.conferenceCleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10
dc.source.conferencedate7/10/2007
dc.source.conferencelocationWashington, DC USA
imec.availabilityPublished - open access
imec.internalnotesECS Trans.; Vol.11, nr.2


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