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Instability and defects in gate dielectric: similarity and differences between Hf-stacks and SiO2
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Instability and defects in gate dielectric: similarity and differences between Hf-stacks and SiO2
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Date
2007
Proceedings Paper
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14520.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Zhang, J.F.
;
Zhao, C.Z.
;
Chang, M.H.
;
Zhang, W.
;
Groeseneken, Guido
;
Pantisano, Luigi
;
De Gendt, Stefan
;
Heyns, Marc
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1870
since deposited on 2021-10-16
Acq. date: 2025-12-10
Citations
Metrics
Views
1870
since deposited on 2021-10-16
Acq. date: 2025-12-10
Citations