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Barrier reliability for Cu contacts

dc.contributor.authorZhao, Chao
dc.contributor.authorDemuynck, Steven
dc.contributor.authorVan den Bosch, Geert
dc.contributor.authorTokei, Zsolt
dc.contributor.authorBeyer, Gerald
dc.date.accessioned2021-10-16T22:01:16Z
dc.date.available2021-10-16T22:01:16Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13267
dc.sourceIIOimport
dc.titleBarrier reliability for Cu contacts
dc.typeProceedings paper
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.imecauthorVan den Bosch, Geert
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.orcidimecVan den Bosch, Geert::0000-0001-9971-6954
dc.source.peerreviewno
dc.source.conferenceAdvanced Semiconductor Technology Symposium
dc.source.conferencedate18/10/2007
dc.source.conferencelocationBeijing China
imec.availabilityPublished - imec


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