dc.contributor.author | Adelmann, Christoph | |
dc.contributor.author | Ferain, Isabelle | |
dc.contributor.author | Franquet, Alexis | |
dc.contributor.author | Conard, Thierry | |
dc.contributor.author | Witters, Thomas | |
dc.contributor.author | Richard, Olivier | |
dc.contributor.author | Bender, Hugo | |
dc.contributor.author | Meersschaut, Johan | |
dc.contributor.author | Kittl, Jorge | |
dc.contributor.author | Van Elshocht, Sven | |
dc.date.accessioned | 2021-10-17T06:13:16Z | |
dc.date.available | 2021-10-17T06:13:16Z | |
dc.date.issued | 2008 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/13281 | |
dc.source | IIOimport | |
dc.title | Interface formation in rare-earth oxide containing advanced gate stacks | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Adelmann, Christoph | |
dc.contributor.imecauthor | Franquet, Alexis | |
dc.contributor.imecauthor | Conard, Thierry | |
dc.contributor.imecauthor | Witters, Thomas | |
dc.contributor.imecauthor | Richard, Olivier | |
dc.contributor.imecauthor | Bender, Hugo | |
dc.contributor.imecauthor | Meersschaut, Johan | |
dc.contributor.imecauthor | Van Elshocht, Sven | |
dc.contributor.orcidimec | Adelmann, Christoph::0000-0002-4831-3159 | |
dc.contributor.orcidimec | Franquet, Alexis::0000-0002-7371-8852 | |
dc.contributor.orcidimec | Conard, Thierry::0000-0002-4298-5851 | |
dc.contributor.orcidimec | Richard, Olivier::0000-0002-3994-8021 | |
dc.contributor.orcidimec | Meersschaut, Johan::0000-0003-2467-1784 | |
dc.contributor.orcidimec | Van Elshocht, Sven::0000-0002-6512-1909 | |
dc.source.peerreview | no | |
dc.source.conference | 15th Workshop on Dielectrics in Microelectronics - WODIM | |
dc.source.conferencedate | 23/06/2008 | |
dc.source.conferencelocation | Bad Saarow Germany | |
imec.availability | Published - imec | |