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dc.contributor.authorAdelmann, Christoph
dc.contributor.authorFerain, Isabelle
dc.contributor.authorFranquet, Alexis
dc.contributor.authorConard, Thierry
dc.contributor.authorWitters, Thomas
dc.contributor.authorRichard, Olivier
dc.contributor.authorBender, Hugo
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorKittl, Jorge
dc.contributor.authorVan Elshocht, Sven
dc.date.accessioned2021-10-17T06:13:16Z
dc.date.available2021-10-17T06:13:16Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13281
dc.sourceIIOimport
dc.titleInterface formation in rare-earth oxide containing advanced gate stacks
dc.typeOral presentation
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorWitters, Thomas
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.source.peerreviewno
dc.source.conference15th Workshop on Dielectrics in Microelectronics - WODIM
dc.source.conferencedate23/06/2008
dc.source.conferencelocationBad Saarow Germany
imec.availabilityPublished - imec


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