Influence of vacuum environment on conductive atomic force microscopy measurements of advanced metal-oxide-semiconductor gate dielectrics
dc.contributor.author | Aguilera, Lidia | |
dc.contributor.author | Polspoel, Wouter | |
dc.contributor.author | Volodin, Alexander | |
dc.contributor.author | Van Haesendonck, Chris | |
dc.contributor.author | Porti, Marc | |
dc.contributor.author | Vandervorst, Wilfried | |
dc.contributor.author | Nafria, Montserrat | |
dc.contributor.author | Aymerich, Xavier | |
dc.date.accessioned | 2021-10-17T06:13:32Z | |
dc.date.available | 2021-10-17T06:13:32Z | |
dc.date.issued | 2008 | |
dc.identifier.issn | 1071-1023 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/13295 | |
dc.source | IIOimport | |
dc.title | Influence of vacuum environment on conductive atomic force microscopy measurements of advanced metal-oxide-semiconductor gate dielectrics | |
dc.type | Journal article | |
dc.contributor.imecauthor | Vandervorst, Wilfried | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 1445 | |
dc.source.endpage | 1449 | |
dc.source.journal | Journal of Vacuum Science and Technology B | |
dc.source.issue | 4 | |
dc.source.volume | 26 | |
imec.availability | Published - open access |