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Electrical performance comparison of embedded Si1-xGex source/drain junctions processed in 200 mm and 300 mmEpi-reactors

dc.contributor.authorBargallo Gonzalez, Mireia
dc.contributor.authorSimoen, Eddy
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorVerheyen, Peter
dc.contributor.authorLoo, Roger
dc.contributor.authorCaymax, Matty
dc.contributor.authorMachkaoutsan, Vladimir
dc.contributor.authorTomasini, P.
dc.contributor.authorThomas, S.G.
dc.contributor.authorWise, R.
dc.contributor.authorClaeys, Cor
dc.date.accessioned2021-10-17T06:15:12Z
dc.date.available2021-10-17T06:15:12Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13341
dc.sourceIIOimport
dc.titleElectrical performance comparison of embedded Si1-xGex source/drain junctions processed in 200 mm and 300 mmEpi-reactors
dc.typeProceedings paper
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorMachkaoutsan, Vladimir
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage539
dc.source.endpage543
dc.source.conferenceSemiconductor Advances for Future Electronics Workshop - SAFE
dc.source.conferencedate27/11/2008
dc.source.conferencelocationVeldhoven The Netherlands
imec.availabilityPublished - open access


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