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dc.contributor.authorBargallo Gonzalez, Mireia
dc.contributor.authorSimoen, Eddy
dc.contributor.authorNaka, N.
dc.contributor.authorOkuno, Y
dc.contributor.authorEneman, Geert
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorVerheyen, Peter
dc.contributor.authorLoo, Roger
dc.contributor.authorClaeys, Cor
dc.contributor.authorMachkaoutsan, Vladimir
dc.contributor.authorTomasini, Pierre
dc.contributor.authorThomas, S.G.
dc.contributor.authorLu, J.P
dc.contributor.authorWise, Rick
dc.date.accessioned2021-10-17T06:15:15Z
dc.date.available2021-10-17T06:15:15Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13342
dc.sourceIIOimport
dc.titleStress analysis of Si1-xGex embedded source/drain junctions
dc.typeJournal article
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorEneman, Geert
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorMachkaoutsan, Vladimir
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.source.peerreviewno
dc.source.beginpage285
dc.source.endpage290
dc.source.journalMaterials Sicience in Semiconductor Processing
dc.source.issue5
dc.source.volume11
imec.availabilityPublished - imec
imec.internalnotesE-MRS 2008 Spring Conference Symposium J: Beyond Silicon Technology: Materials and Devices for Post-Si CMOS


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